SYSTEM AND METHOD FOR CORRECTING PHOTOMASK

An embodiment of the present invention provides a photo-mask repair system and method for repairing a photo-mask, which is used in a semiconductor process, through dissociation of gas using a laser beam when the photo-mask is required to be repaired. The disclosed photo-mask repair system comprises:...

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Bibliographic Details
Main Authors PARK, ILL HYUN, HWANG, DAE SOON, KIM, YOUNG JUNG
Format Patent
LanguageChinese
English
Published 11.04.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:An embodiment of the present invention provides a photo-mask repair system and method for repairing a photo-mask, which is used in a semiconductor process, through dissociation of gas using a laser beam when the photo-mask is required to be repaired. The disclosed photo-mask repair system comprises: a chamber in which a photo-mask to be repaired is placed; a vacuum device for maintaining the interior of the chamber in a vacuum state; a gas supply unit for supplying an etching gas and a passivation gas into the chamber; and a laser device disposed within the chamber and dissociating the etching gas within the chamber by applying a laser beam to a portion of the photo-mask to be repaired, wherein the passivation gas is adsorbed onto the portion of the photo-mask to be repaired to uniformly etch the same.
Bibliography:Application Number: TW20160130250