PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR RESISTOR STRUCTURE AND DISPLAY USING THE SAME

• Main Authors: TSAI, YU CHAN, CHANG, HUNG PIN
• Format: Patent
• Language: Chinese; English
• Published: 11.02.2018
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; DYES; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; LAKES; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; MORDANTS; NATURAL RESINS; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; THEIR PREPARATION OR CHEMICAL WORKING-UP

A photosensitive resin composition includes a colorant, a resin, a photopolymerizable monomer, a photopolymerization initiator and a solvent. The colorant includes a red pigment, which includes at least one of DPP and Br-DPP, and a dye, which includes a silicon atom and has a maximum absorbing wave length of 500 nm to 600 nm in chloroform. The resin includes a monomer unit of first type from a monomer of first type, which is an unsaturated compound having a N-cyclohexylmaleimide group, and a monomer unit of second type from a monomer of second type, which is selected from a group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, wherein the monomer unit of first type takes up at least 50 mol% of the resin.