Polymer, organic layer composition, and method of forming patterns

• Main Authors: KWON, HYO YOUNG, MUN, SOOHYOUN, NAMGUNG, RAN, SONG, HYUNJI, NAM, YOUNHEE
• Format: Patent
• Language: Chinese; English
• Published: 11.09.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

Provided is a polymer which shows excellent etching resistance and favorable solubility, and includes: a first part represented by chemical formula 1; and a second part including a substituted or non-substituted cyclic group having 6-60 carbon atoms, a substituted or non-substituted heterocyclic group having 6-60 carbon atoms, or a combination thereof. The chemical formula 1 is the same as defined in the present specification.