Polymer, organic layer composition, and method of forming patterns

Provided is a polymer which shows excellent etching resistance and favorable solubility, and includes: a first part represented by chemical formula 1; and a second part including a substituted or non-substituted cyclic group having 6-60 carbon atoms, a substituted or non-substituted heterocyclic gro...

Full description

Saved in:
Bibliographic Details
Main Authors KWON, HYO YOUNG, MUN, SOOHYOUN, NAMGUNG, RAN, SONG, HYUNJI, NAM, YOUNHEE
Format Patent
LanguageChinese
English
Published 11.09.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
Online AccessGet full text

Cover

More Information
Summary:Provided is a polymer which shows excellent etching resistance and favorable solubility, and includes: a first part represented by chemical formula 1; and a second part including a substituted or non-substituted cyclic group having 6-60 carbon atoms, a substituted or non-substituted heterocyclic group having 6-60 carbon atoms, or a combination thereof. The chemical formula 1 is the same as defined in the present specification.
Bibliography:Application Number: TW20160109097