TWI591231B

Provided is an embroidery pattern placement system including: an image-taking unit configured to take an image with an embroidery frame and cloth to be embroidered included in an image taking range; an image analyzing unit configured to analyze to make correspondence between the information of the e...

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Bibliographic Details
Main Authors KONGO, TAKESHI, ISHII, KYOKO
Format Patent
LanguageChinese
Published 11.07.2017
Subjects
EMBROIDERING
SEWING
TEXTILES
TUFTING
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Summary:Provided is an embroidery pattern placement system including: an image-taking unit configured to take an image with an embroidery frame and cloth to be embroidered included in an image taking range; an image analyzing unit configured to analyze to make correspondence between the information of the embroidery frame obtained by the embroidery frame information obtaining unit and the embroidery frame in the image; a display control unit configured to display the embroidery pattern obtained by the embroidery pattern obtaining unit and at least a part of the image taken by the image-taking unit in an overlapping manner at an identical scale; and an operation unit configured to accept an operation from a user; an embroidery placement editing unit configured to determine a position and orientation of the embroidery pattern relative to the embroidery frame according to a content of the operation to the operation unit.
Bibliography:Application Number: TW20150125156