Ion source
An ion source has an evaporator and one or more of the following methods are adopted to control the temperature of the materials in the evaporator. Firstly, a distance between the materials in a container and an adjacent arc chamber is adjustable; secondly, when two or more containers exist in the e...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
21.11.2016
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Subjects | |
Online Access | Get full text |
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Summary: | An ion source has an evaporator and one or more of the following methods are adopted to control the temperature of the materials in the evaporator. Firstly, a distance between the materials in a container and an adjacent arc chamber is adjustable; secondly, when two or more containers exist in the evaporator, the distances between the containers and the adjacent arc chamber are not the same; thirdly, a heater/or a cooler is used for introducing heat into or bringing heat away from the evaporator, i.e., the containers are positioned in the evaporator; and fourthly, a heat shield is positioned between the evaporator and the adjacent arc chambers to shield heat radiation. Thus the temperature in the containers is adjustable and not just decided by the adjacent arc chamber. Furthermore, the ion source has a repelling electrode composed of rare earth elements to directly generate rare earth elements in the arc chamber. |
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Bibliography: | Application Number: TW20143144908 |