TWI546156B

• Main Authors: ZHONG, RUN-WEN, LU, QUAN-LANG, SHEN, WEN-YAN, DAI, ZI-XUAN, WEI, KUANG-LING
• Format: Patent
• Language: Chinese
• Published: 21.08.2016
• Subjects: DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; TRANSPORTING

The present invention provides a polishing pad conditioning tool and a method of manufacturing the same. The polishing pad conditioning tool includes a sapphire chip body having a specific axial direction and a protection film. The upper surface of the sapphire chip body possesses a micro-structure...