Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method

• Main Authors: DEN BESTEN, JAN HENDRIK, VANOPPEN, PETER CLEMENT PAUL, HINNEN, PAUL CHRISTIAAN, CRAMER, HUGO AUGUSTINUS JOSEPH, ENGELEN, ADRIANUS FRANSISCUS PETRUS, BROUWER, ERIC JOS ANTON
• Format: Patent
• Language: Chinese; English
• Published: 11.06.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A method of determining exposure dose of a lithographic apparatus used in a lithographic process on a substrate. Using the lithographic process to produce a first structure on the substrate, the first structure having a dose-sensitive feature which has a form that depends on exposure dose of the lithographic apparatus on the substrate. Using the lithographic process to produce a second structure on the substrate, the second structure having a dose-sensitive feature which has a form that depends on the exposure dose of the lithographic apparatus but which has a different sensitivity to the exposure dose than the first structure. Detecting scattered radiation while illuminating the first and second structures with radiation to obtain first and second scatterometer signals. Using the first and second scatterometer signals to determine an exposure dose value used to produce at least one of the first and second structures.