Method and apparatus for dressing polishing pad
The method of the present invention are capable of stabilizing a polishing rate, reducing number of times of performing dressing operations, improving work efficiency and extending a span of life of the polishing pad. The method for dressing a polishing pad, which has been used to polish a surface o...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
11.10.2015
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Subjects | |
Online Access | Get full text |
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Summary: | The method of the present invention are capable of stabilizing a polishing rate, reducing number of times of performing dressing operations, improving work efficiency and extending a span of life of the polishing pad. The method for dressing a polishing pad, which has been used to polish a surface of a work by pressing the work onto the polishing pad fixed on a polishing plate (14, 15) with supplying slurry thereto, by using a grind stone, comprising the step of cleaning the polishing pad by supplying high-pressure cleaning water to the polishing pad, is characterized by the step of dressing the polishing pad by moving a dressing grind stone (26), in the radial direction of the polishing pad, along a surface profile thereof, while performing the cleaning step. |
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Bibliography: | Application Number: TW20110119502 |