TWI487664B
To provide dense hollow particles having a thin shell, a process for simply producing the hollow particles at low cost, a coating composition for forming a coating film having a high antireflection property and an article having a coating film having a high antireflection property. Hollow particles...
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Main Authors | , |
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Format | Patent |
Language | Chinese |
Published |
11.06.2015
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Subjects | |
Online Access | Get full text |
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Summary: | To provide dense hollow particles having a thin shell, a process for simply producing the hollow particles at low cost, a coating composition for forming a coating film having a high antireflection property and an article having a coating film having a high antireflection property. Hollow particles each composed of a shell made of silicon oxide as the main component, wherein the thickness of the shell is from 0.5 to 4 nm, and in the histogram of the pore volume obtained by the nitrogen adsorption method, the maximum value of the pore volume is from 0.01 to 0.08 mUg within the range of the pore diameter of at most 3 nm. |
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Bibliography: | Application Number: TW200998118360 |