Polishing composition

A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuK±1 ray (» = 0.154050 nm) irradiation includes a peak (first peak) having a...

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Bibliographic Details
Main Authors SHIROTA, MAMI, YONEDA, YASUHIRO
Format Patent
LanguageChinese
English
Published 21.06.2014
Subjects
ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM,CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THERARE-EARTH METALS
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
INORGANIC CHEMISTRY
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
POLISHES
POLISHING
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuK±1 ray (» = 0.154050 nm) irradiation includes a peak (first peak) having a peak top in a diffraction angle 2¸ (¸ is a Bragg angle) range of 28.61 to 29.67°, a peak (second peak) having a peak top in a diffraction angle 2¸ range of 33.14 to 34.53°, a peak (third peak) having a peak top in a dim-action angle 2¸ range of 47.57 to 49.63°, and a peak (fourth peak) having a peak top in a diffraction angle 2¸ range of 56.45 to 58.91°. A half-width of the first peak is 0.8° or less.
Bibliography:Application Number: TW200796151339