Photosensitive resin and production method of microlens

• Main Authors: NEGI, TAKAYUKI, KISHIOKA, TAKAHIRO, SAKAGUCHI, TAKAHIRO
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2014
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS