TWI417310B

Provided is a block polyisocyanate composition comprising at least one block polyisocyanate represented by formula (I): R-(A) x B) y . In formula (I), R is a residue obtained by removing an isocyanate group from a polyisocyanate composed of one or more polyisocyanates selected from aliphatic polyiso...

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Bibliographic Details
Main Authors MIYAZAKI, TAKAYUKI, SHINOMIYA, KIE, YAMAUCHI, MASAKAZU, ITAMOCHI, TAKAHIRO
Format Patent
LanguageChinese
Published 01.12.2013
Subjects
ADHESIVES
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
COMPOSITIONS BASED THEREON
CORRECTING FLUIDS
DYES
FILLING PASTES
INKS
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
USE OF MATERIALS THEREFOR
WOODSTAINS
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Summary:Provided is a block polyisocyanate composition comprising at least one block polyisocyanate represented by formula (I): R-(A) x B) y . In formula (I), R is a residue obtained by removing an isocyanate group from a polyisocyanate composed of one or more polyisocyanates selected from aliphatic polyisocyanates, alicyclic polyisocyanates, and aromatic polyisocyanates and is bonded to a substituent containing A and B; A is a group of one or more keto compounds represented by formula (II) or enol isomers thereof; B is one or more constituent units represented by formula (III); and the sum of x and y is from 2.0 to 20, and x is not 0.
Bibliography:Application Number: TW20110104187