Novel method and system for advanced reticle conta

A method includes introducing an acid solution having ethanol and an acid to a substrate and cleaning the substrate using the acid solution; applying an ultrasonic wave to the acid solution substantially during the cleaning of the substrate; and performing a fine cleaning of the substrate after the...

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Bibliographic Details
Main Authors HSU, SHENGCHANG, KUNG, CHUNHUNG, LAI, CHIANHUN, HSU, HSIANGCHIEN, CHANG, JONGYUH, CHEN, CHIAHSIEN
Format Patent
LanguageChinese
English
Published 01.02.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A method includes introducing an acid solution having ethanol and an acid to a substrate and cleaning the substrate using the acid solution; applying an ultrasonic wave to the acid solution substantially during the cleaning of the substrate; and performing a fine cleaning of the substrate after the cleaning of substrate with the acid solution.
Bibliography:Application Number: TW200695130726