Photosensitive resin composition using photopolymer

• Main Authors: PARK, CHAN-SEOK, KIM, GIL-LAE, KIM, BONG-GI
• Format: Patent
• Language: Chinese; English
• Published: 01.02.2009
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; THEIR PREPARATION OR CHEMICAL WORKING-UP

PURPOSE: A photosensitive resin composition using a photopolymer is provided to enhance a developing characteristic under a small quantity of exposure by using a resin having a crosslinkable photopolymer. CONSTITUTION: A photosensitive resin composition using a photopolymer includes a macro-polymer of 1 to 30 weight percent, a crosslinkable monomer of 5 to 10 weight percent, paints of 10 to 60 percent, a photopolymerization initiator of 0.5 to 5 weight percent, and a solvent of 20 to 80 weight percent. The macro-polymer is expressed by a predetermined chemical formula. The macro-polymer has an average molecular weight of 10,000 to 40,000. The crosslinkable monomer has two or more ethylene-based dual bonds.