Device and Method for Sputtering with a moveable Target

• Main Authors: UDO WILLKOMMEN, WOLFGANG FUKAREK, RALF HAUSWALD
• Format: Patent
• Language: Chinese; English
• Published: 01.08.2008
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a device for atomising material in a vacuum chamber with the aid of a displaceable target device (1) comprising a planar target (2) which can be switched as a cathode and which can be displaced on a plane. The inventive device comprises a stationary target environment (16), a drive device (8, 9) which is associated with the target device, an anode device (6) comprising at least one anode (6a, 6b) which is associated with the target (2) and a stationary magnet device (3) which is used to produce a magnet field in order to reinforce the removal of material from an atomising surface of the target (2). The inventive device is characterised in that it comprises at least one non-rotational symmetrical target (2) which is embodied, preferably, as a rectangular target plate, and which can be displaced on a plane by means of the target device (1). The invention also relates to a method for atomising material.