Positive photoresist composition for manufacturing system LCD, manufacturing method for the positive photoresist and formation method of resist pattern

• Main Authors: OHUCHI, YASUHIDE, NIIKURA, SATOSHI, DOI, KOUSUKE
• Format: Patent
• Language: English
• Published: 21.08.2007
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

A positive photoresist composition is provided which is excellent in storage stability and is favorable for manufacturing system LCD having integrated circuits and liquid crystal display portions on a substrate. The positive photoresist composition for manufacturing system LCD is obtained by dissolving into an organic solvent, (A) an alkali soluble resin, (B) a naphthoquinonediazido ester compound containing esterification reaction product of a compound represented by the following general formula (I) with 1,2-naphthoquinonediazide sulfonyl compound, (C) a phenolic hydroxyl group-containing compound with a molecular weight no more than 1000 and (D) a reduction inhibiting agent.