Substrate processing system

• Main Authors: TAKASE, SHINJI, SHIMAI, FUTOSHI, KUMAZAWA, HIROTSUGU
• Format: Patent
• Language: English
• Published: 21.05.2007
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TRANSPORTING

The object of the present invention is to provide a substrate processing system capable of uniformly performing the developing process and the like and corresponding to an increased substrate dimension. To solve the problem, there is provided a substrate processing system comprising a substrate carrying part 1, a transferring device 2, and a substrate processing device 3. The substrate is composed of a plurality of carrying rollers 11 and a pair of carrying belts 12. The transferring device 2 is composed of clamping plate and the like. The substrate processing part 3 takes the position of the transferring device 2 as a standard for being arranged as a status overlapped with the plane figure of the substrate carrying part 1 on the up-stream side and down-stream side of the substrate carrying part 1. Each substrate processing part 3 includes an arm 31 for transferring substrates to and from the transferring device 2; a spraying nozzle 32 kept on the arm 31 for supplying processing liquid such as developing liquid to the substrate surface; a recycling spray 33 for recycling the processing liquid such as developing liquid supplied to the substrate surface.