Radiation curable composition, optical wave-guide and method for formation thereof

• Main Authors: HUANGFU, JUN, ERIYAMA, YUUICHI, TAKASE, HIDEAKI, UTAKA, TOMOHIRO, TAMAKI, KENTAROU
• Format: Patent
• Language: English
• Published: 21.02.2007
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DYES; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; USE OF MATERIALS THEREFOR; WOODSTAINS

A radiation curable composition comprises (A) a hydrolyzate of a hydrolyzable silane compound represented by the general formula (1): (R1)p(R2)qSi(X)4-p-q, wherein R1 is a non-hydrolyzable organic group having 1 to 12 carbon atoms and containing a fluorine atom, R2 is a non-hydrolyzable organic group having 1 to 12 carbon atoms (except the one containing a fluorine atom), X is a hydrolyzable group, p is an integer of 1 or 2, and q is an integer of 0 or 1, or a condensate thereof; and (B) an agent generating an acid by the irradiation with a light, and contains a silanol (Si-OH) group in an amount of 0.1 to 0.5 relative to the total amount of bonding groups on the silicon therein. The composition allows the formation of an optical wave guide which is reduced in a wave-guide loss with respect to lights having wave lengths of a wide range from a visible region to a near infrared region, and also is excellent in the resistance to cracking, characteristics of patterning by irradiation with a radiation, and the like.