Non-foamed polishing pad and polishing method therewith

A polishing pad made of a non-foamed resin material has surface roughness Ra in the range of 0.1-10 mum, or preferably 0.5-1.5 mum and variations in thickness less than 50 mum, or preferably less than 30 mum. Its Shore D hardness is greater than 60 degrees, or preferably 68 degrees. Its compressibil...

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Bibliographic Details
Main Authors IZUMI, TOSHIHIRO, OHNO, HISATOMO, MILLER, CLAUGHTON, YOSHIZAWA, YASUSHI, WATANABE, JUN
Format Patent
LanguageEnglish
Published 01.02.2007
Subjects
DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TOOLS FOR GRINDING, BUFFING, OR SHARPENING
TRANSPORTING
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Summary:A polishing pad made of a non-foamed resin material has surface roughness Ra in the range of 0.1-10 mum, or preferably 0.5-1.5 mum and variations in thickness less than 50 mum, or preferably less than 30 mum. Its Shore D hardness is greater than 60 degrees, or preferably 68 degrees. Its compressibility is less than 3%, or preferably less than 1% and its elasticity is greater than 30%, or preferably 50%, as measured by specified methods. Grooves may be formed over 30%-70%, or preferably 40%-60% of the total area of the polishing surface. When the polishing surface is subjected to a dressing process, its surface roughness Ra is restored to 0.1-10 mum, or preferably 0.5-1.5 mum.
Bibliography:Application Number: TW200392108037