Photo chemical vapor deposition machine, configuration of photo chemical vapor deposition machine and deposition process

• Main Authors: WU, CHIH-HAO, HUANG, LI-TIEN, YANG, FU-HSIANG, LEE, HSINN, CHIU, WEN-ZHENG
• Format: Patent
• Language: English
• Published: 11.11.2006
• Edition: 7
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A photo chemical vapor deposition machine comprising a light source and a chamber having a wall and a substrate carrier. The light source is disposed outside the chamber. The radiation emitted by the light source is passed through the wall of the chamber into the chamber. The photo chemical vapor deposition machine further comprises a plasma generator connecting to the chamber. The photo chemical vapor deposition machine of this invention can complete the deposition process and removal process of films in the chamber thereof so that the photo chemical vapor deposition machine can save the process time and cost.