Method and apparatus for seasoning semiconductor apparatus of sensing plasma equipment

A plasma equipment seasoning method and plasma equipment to which the seasoning method is applied. The seasoning method comprising the steps of measuring the ratio of optical emission intensity of silicon oxide (SiOx)-based chemical species present in a process chamber of plasma equipment before ope...

Full description

Saved in:
Bibliographic Details
Main Authors SONG, YEONG-SU, OH, SANG-RYONG, KIM, NAM-HUN, KIM, SHEUNG-KI
Format Patent
LanguageEnglish
Published 21.08.2006
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:A plasma equipment seasoning method and plasma equipment to which the seasoning method is applied. The seasoning method comprising the steps of measuring the ratio of optical emission intensity of silicon oxide (SiOx)-based chemical species present in a process chamber of plasma equipment before operating the plasma equipment to perform a plasma process, determining whether the value of the measured optical emission intensity ratio is within a predetermined range of normal state or not, and, when reaction gas to be used in the plasma process is supplied into the process chamber based on the result of determination such that the value of the measured optical emission intensity ratio is within the predetermined range of normal state, seasoning the interior of the process chamber to change the ratio of components of the reaction gas, and thus, to change the optical emission intensity ratio.
Bibliography:Application Number: TW20050109278