Mask processing apparatus, mask processing method, program and mask

The present invention provides the technique related to a kind of mask processing apparatus, mask processing method, program and mask. According to the design data 151 and the mask characteristic data 152 where at least the characteristic of complementary mold plate mask is shown, the followings are...

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Bibliographic Details
Main Authors NAKAYAMA, KOHICHI, ASHIDA, ISAO
Format Patent
LanguageEnglish
Published 01.04.2006
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:The present invention provides the technique related to a kind of mask processing apparatus, mask processing method, program and mask. According to the design data 151 and the mask characteristic data 152 where at least the characteristic of complementary mold plate mask is shown, the followings are conducted: the generation of alignment marks; design of mold shape; PUF division and boundary treatment; the complementary division; the connecting process; the arrangement processing of complementary pattern; the verification of pattern shape; inside-film correction for mask composition treatment; exposure verification; mask inverse correction process; verification of the correction result; process of data change; and generation of depicting film data and depicting pattern data.
Bibliography:Application Number: TW200493102506