Lithographic apparatus and device manufacturing method
In a purge gas system for a lithographic apparatus, a rate of flow of purge gas to the system is reduced substantially once a contamination level has fallen below a threshold level. The control may be on the basis of a detected level of contamination or on the basis of a timetable.
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
11.03.2006
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | In a purge gas system for a lithographic apparatus, a rate of flow of purge gas to the system is reduced substantially once a contamination level has fallen below a threshold level. The control may be on the basis of a detected level of contamination or on the basis of a timetable. |
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Bibliography: | Application Number: TW20030125039 |