Positive photoresist composition for system LCD production and resist pattern formation method

• Main Authors: OHUCHI, YASUHIDE, NIIKURA, SATOSHI, DOI, KOUSUKE
• Format: Patent
• Language: English
• Published: 21.02.2006
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

A positive photoresist composition suitable for system LCDs production and having both high sensitivity and high resolution, and a resist pattern formation method are provided. This positive photoresist composition is a positive resist composition for manufacturing system LCDs, having an integrated circuit and a liquid crystal display portion on one substrate, and comprising (A) alkali-soluble resin, (B) a naphthoquinone diazide esterification product, (C) a phenolic hydroxyl group-containing compound with a molecular weight of 1000 or less, and (D) an organic solvent, wherein the (B) component comprises an esterification reaction product of a compound represented by the general formula (I) below, with a 1,2-naphthoquinone diazide-4-sulfonyl compound.