Method for patterning ceramic layers

The invention relates to a method for patterning ceramic layers. In this case, firstly a ceramic material is deposited on a substrate and is subsequently densified by heat treatment, for example. In this case, the initially amorphous material is converted into a crystalline or polycrystalline form....

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Bibliographic Details
Main Authors KUDELKA, STEPHAN, SEIDL, HARALD, HECHT, THOMAS, GUTSCHE, MARTIN, JAKSCHIK, STEFAN
Format Patent
LanguageEnglish
Published 01.01.2006
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The invention relates to a method for patterning ceramic layers. In this case, firstly a ceramic material is deposited on a substrate and is subsequently densified by heat treatment, for example. In this case, the initially amorphous material is converted into a crystalline or polycrystalline form. In order that the now crystalline material can be removed again from the substrate, imperfections are produced in the ceramic material, for example by ion implantation. As a result, the etching medium can more easily attack the ceramic material, so that the latter can be removed with a higher etching rate. Through inclined implantation, the method can be performed in a self-aligning manner and the ceramic material can be removed on one side, by way of example, in trenches or deep trench capacitors.
Bibliography:Application Number: TW200392108271