Lithographic apparatus comprising a gas flushing system

• Main Authors: JONKERS, ADRIANUS CORNELIUS ANTONIUS, DE BOKX, PIETER KLAAS, VAN EMPEL, TJARKO ADRIAAN RUDOLF, HULTERMANS, RONALD JOHANNES
• Format: Patent
• Language: English
• Published: 21.11.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The invention is related to a lithographic projection apparatus comprising a gas flushing system wherein this gas flushing system and a substrate define an intermediate space for a radial gas flow between the gas flushing system and the substrate, and wherein the gas flushing system also comprising...