Lithographic apparatus comprising a gas flushing system

The invention is related to a lithographic projection apparatus comprising a gas flushing system wherein this gas flushing system and a substrate define an intermediate space for a radial gas flow between the gas flushing system and the substrate, and wherein the gas flushing system also comprising...

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Bibliographic Details
Main Authors JONKERS, ADRIANUS CORNELIUS ANTONIUS, DE BOKX, PIETER KLAAS, VAN EMPEL, TJARKO ADRIAAN RUDOLF, HULTERMANS, RONALD JOHANNES
Format Patent
LanguageEnglish
Published 21.11.2005
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:The invention is related to a lithographic projection apparatus comprising a gas flushing system wherein this gas flushing system and a substrate define an intermediate space for a radial gas flow between the gas flushing system and the substrate, and wherein the gas flushing system also comprising extra outlets for generating the radial gas flow, and wherein the gas flushing system, in use, is arranged to generate this radial gas flow such that the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.
Bibliography:Application Number: TW20040103177