Manufacturing method of a thin film transistor-liquid crystal display

• Main Author: CHEN, HUNG-DE
• Format: Patent
• Language: English
• Published: 11.09.2005
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

A manufacturing method of TFT LCD with three mask processes is disclosed. The method includes following steps: providing a transparent substrate; forming a transparent conductive layer., a first insulating layer, and a second metal layer on the substrate in sequence; using a halftone photolithography and an etching technology for forming a source area, a drain area, and a pixel electrode area within every pixel area and forming data signal lines at two sides of every pixel area; forming a semiconductor layer and a second insulating layer on the substrate in sequence; using a photolithography and an etching technology for forming a channel area of a thin film transistor area and contacts on the source area, the drain area, and the data signal lines; forming a third metal layer and a third insulating layer on the substrate in sequence; using a photolithography and an etching technology for forming scanning signal lines and gate lines.