Lithographic projection apparatus, integrated circuit manufacturing method and integrated circuit made thereby

A lithographic projection apparatus comprising: a radiation system for supplying a projection beam PB of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system PL for imaging an irradiate...

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Bibliographic Details
Main Authors JANSEN, HANS, VAN EMPEL, TJARKO ADRIAAN RUDOLF
Format Patent
LanguageEnglish
Published 21.06.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A lithographic projection apparatus comprising: a radiation system for supplying a projection beam PB of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system PL for imaging an irradiated portion of the mask onto a target portion of the substrate, the substrate holder having a supporting face for supporting a substrate, the said supporting face being at least partially coated with a layer of electrically conductive material.
Bibliography:Application Number: TW200089110143