Dynamic film thickness control device/method and ITS coating method
A dynamic film thickness control system/method and its coating method consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for real-time control over deposited film thickness and gradually moves the mask plate accordin...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
11.06.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A dynamic film thickness control system/method and its coating method consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for real-time control over deposited film thickness and gradually moves the mask plate according to the film thickness control value acquired by the film thickness control device, enabling the mask plate to mask film zones on the said substrate to achieve the film thickness of a design objective. When the required zones of deposition are masked, the deposition of a particular film layer is completed. |
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Bibliography: | Application Number: TW200190126544 |