Manufacturing method of the display panel of thin film transistor

The present invention is a manufacturing method of the display panel of thin film transistor, wherein the semiconductor devices and optical devices are integrated on the same side of the substrate, a hydrogen popcorn transfer carrying process is proceeded to transfer the semiconductor devices and op...

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Bibliographic Details
Main Authors LI, JIUNI, LIAU, TZUNG-NENG, DAI, YUAN-DUNG
Format Patent
LanguageEnglish
Published 01.01.2004
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The present invention is a manufacturing method of the display panel of thin film transistor, wherein the semiconductor devices and optical devices are integrated on the same side of the substrate, a hydrogen popcorn transfer carrying process is proceeded to transfer the semiconductor devices and optical devices to the appropriate substrate, and the other processes are proceeded onto the other surfaces of the substrate. Since the present invention can transfer the semiconductor devices and the optical devices simultaneously, the number of temporary substrates consumed in the hydrogen popcorn transfer carrying process can be effectively reduced, and the processing time can be shortened. It is a manufacturing method with high yield rate and low transferring cost.
Bibliography:Application Number: TW20020133471