Phase shift mask and system and method for making the same

A phase shift mask and a system and method for making the same are provided. The phase shift mask comprises a number of phase shifters (173, 176) that define a number of active gate areas (113). Each of the active gate areas (113) is associated with one of a number of active regions (103) of a prede...

Full description

Saved in:
Bibliographic Details
Main Author LUKANC, TODD
Format Patent
LanguageEnglish
Published 01.04.2003
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:A phase shift mask and a system and method for making the same are provided. The phase shift mask comprises a number of phase shifters (173, 176) that define a number of active gate areas (113). Each of the active gate areas (113) is associated with one of a number of active regions (103) of a predefined circuit. The phase shift mask also includes at least one joined phase shifter (183) defining at least two of the active gate areas (113). The joined phase shifter (183) extends between at least two of the active regions (103).
Bibliography:Application Number: TW20020100166