Metal contamination method of wet platform

This invention relates to a metal contamination method of wet platform used to automatically detect any metal particles on the wafer surface before transferring the wafer into the wet platform from outside of the wet platform. The method consists of the following steps: firstly, providing a plural n...

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Bibliographic Details
Main Authors PENG, JIANG-REN, SU, YU-SHENG, SU, BIN-JIA, WU, WEN-LANG
Format Patent
LanguageEnglish
Published 11.10.2002
Edition7
Subjects
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