Method for manufacturing complementary metal oxide semiconductor transistor

The present invention provides a method for manufacturing complementary metal oxide semiconductor transistor on a semiconductor chip. The semiconductor chip comprises a substrate,a first gate on the substrate for forming the PMOS transistor of the CMOS transistor, and a second gate on the substrate...

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Bibliographic Details
Main Authors SHENG, YIUNG, CHEN, CHIN-LAI, HUANG, CHENG-TUNG, HSU, SHIHIEH
Format Patent
LanguageEnglish
Published 07.06.2001
Edition7
Subjects
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