Method for manufacturing photosensor with color filter

A method for manufacturing a photosensor comprises providing a substrate having a transparent and planarized insulating layer; forming a color filter on a photo-receiving region of the substrate; depositing a conductor layer on the substrate and exposing the color filter on the photo-receiving regio...

Full description

Saved in:
Bibliographic Details
Main Author LIN, SHR-YAU
Format Patent
LanguageEnglish
Published 11.11.2000
Edition7
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A method for manufacturing a photosensor comprises providing a substrate having a transparent and planarized insulating layer; forming a color filter on a photo-receiving region of the substrate; depositing a conductor layer on the substrate and exposing the color filter on the photo-receiving region; and coating a protective layer to protect the color filter.
Bibliography:Application Number: TW19990111644