Positive tone patterns from metal organic resists

The disclosed and claimed subject matter relates to the use of a metal organic resist (MOR) resist in positive tone processing for high resolution patterning using actinic radiation, in particular EUV radiation of 13.5 nm wavelength.

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Bibliographic Details
Main Authors HUDSON, DANIEL, PRADELLA, JENS, SCHENK, THORSTEN, AYDIN, KUEBRA
Format Patent
LanguageChinese
English
Published 16.05.2025
Subjects
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:The disclosed and claimed subject matter relates to the use of a metal organic resist (MOR) resist in positive tone processing for high resolution patterning using actinic radiation, in particular EUV radiation of 13.5 nm wavelength.
Bibliography:Application Number: TW20240129663