Nozzle unit, liquid processing device, and liquid processing method

• Main Authors: MIYAKUBO, YUSUKE, MIURA, TAKUYA, TAKAHASI, SHOGO, TANAKA, KOUICHIROU, YOSHIHARA, KENTARO
• Format: Patent
• Language: Chinese; English
• Published: 16.04.2025
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; NOZZLES; PERFORMING OPERATIONS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

An object of the invention is to improve the uniformity of the temperature distribution within the plane of a substrate. A nozzle unit according to an aspect of the invention is a unit for a liquid processing device that subjects a substrate to liquid processing using a solution. This nozzle unit comprises a gas nozzle having a discharge flow channel through which a gas is transported and a discharge port that discharges the gas flowing through the discharge flow channel toward the surface of the substrate. The discharge port is formed so as to extend in a first direction across the surface. The width of the discharge flow channel in the first direction increases with increasing proximity to the discharge port so that the gas from the discharge port is discharged in a radial pattern.