Resin composition for forming phase-separated structure, and method for producing structure including phase-separated structure wherein the invention provides a resin composition for forming phase-separated structures, improving process margins with specific block copolymers A and B in a defined ratio

• Main Authors: DAZAI, TAKAHIRO, IINO, SHOTA, MIYAGI, KEN
• Format: Patent
• Language: Chinese; English
• Published: 01.02.2025
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

The subject of the present invention is to provide a resin composition for forming a phase-separated structure that can improve process margins. The solution of the present invention is a resin composition for forming a phase-separated structure, which contains specific block copolymer A and block copolymer B, where the ratio of L0 (L0 B) of the block copolymer B to L0 (L0 A) of the block copolymer A (L0 B/L0 A) is 0.70 to 1.20.