Resist composition and resist pattern forming method

A resist composition including a silicon-containing resin and an acid generator component that generates acid upon exposure.

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Bibliographic Details
Main Authors YAMADA, TOMOTAKA, IBATA, KEIICHI
Format Patent
LanguageChinese
English
Published 16.07.2024
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HETEROCYCLIC COMPOUNDS
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:A resist composition including a silicon-containing resin and an acid generator component that generates acid upon exposure.
Bibliography:Application Number: TW202312133238