Etchant composition for metal layer containing silver or indium oxide layer and preparation method thereof minimizing film damage and defects and ensuring excellent etching characteristics

• Main Authors: KIM, JAE-YEOP, KIM, YANG-RYEONG, PARK, SANG-SEUNG, LEE, BO-YEON, WOO, SEUNG-HEE, LEE, HEE-WOONG, KIM, SE-HOON, JEONG, MIN-GYEONG
• Format: Patent
• Language: Chinese; English
• Published: 01.07.2024
• Subjects: ADHESIVES; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; DYES; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NATURAL RESINS; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; PAINTS; POLISHES

The present invention relates to an etchant composition for metal layer containing a silver or an indium oxide layer and a preparation method thereof. According to the present invention, by inhibiting damage to the lower film and minimizing the generation of deviation defects and residues or precipitates, excellent etching characteristics are exhibited. An etchant composition for metal layer containing a silver or an indium oxide layer includes: a nitrogen compound; a sulfate; a sulfonic acid compound; and a carboxylic acid. The sulfonic acid compound includes a compound represented by chemical formula 1 or a salt thereof; and a compound represented by chemical formula 2 or a salt thereof, In the chemical formula 1, R1 is C1-C10 alkyl group. In the chemical formula 2, R2 is (C1-C10 alkyl) benzyl, benzyl, amino (C1-C10 alkyl), C1-C10 alkyl or aminobenzyl.