Substrate manufacturing method, embedded substrate and semiconductor

• Main Authors: HUANG, BEN-XIA, HUANG, JUN, HONG, YE-JIE, HUANG, GAO, CHEN, XIAN-MING, LIN, WEN-JIAN
• Format: Patent
• Language: Chinese; English
• Published: 16.05.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A substrate manufacturing method, an embedded substrate and a semiconductor are disclosed. The method includes: manufacturing a first semi-finished substrate including first circuit layers and a first dielectric layer arranged in staggered and laminated manner; arranging a viscous material layer on the first circuit layer to form a device adhering area; adhering an embedded device on the device adhering area, a pin face of the embedded device facing away from the viscous material layer; laminating a second dielectric layer on the first circuit layer, which covers the viscous material layer and the embedded device; manufacturing a first conductive pillar, a second conductive pillar and a second circuit layer, the first conductive pillar extending through the second dielectric layer and configured for connecting the second circuit layer with the first circuit layer, the second conductive pillar being configured for connecting the embedded device with the second circuit layer.