Method of operating plasma doping system and cleaning system

• Main Authors: DENO, VINCENT, CAI, MENG, BHOSLE, VIKRAM M, MITTAL, DEVEN MATTHEW RAJ
• Format: Patent
• Language: Chinese; English
• Published: 16.05.2024
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method of operating plasma doping system and cleaning system are disclosed. The method includes the following steps. A plurality of workpieces inside a plasma chamber is processed by creating a plasma using a dopant species, wherein some of the dopant species is deposited on interior surfaces of t...