Method of operating plasma doping system and cleaning system

• Main Authors: DENO, VINCENT, CAI, MENG, BHOSLE, VIKRAM M, MITTAL, DEVEN MATTHEW RAJ
• Format: Patent
• Language: Chinese; English
• Published: 16.05.2024
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method of operating plasma doping system and cleaning system are disclosed. The method includes the following steps. A plurality of workpieces inside a plasma chamber is processed by creating a plasma using a dopant species, wherein some of the dopant species is deposited on interior surfaces of the plasma chamber during the processing. The interior surfaces of the plasma chamber is cleaned, after processing the plurality of workpieces, by creating a cleaning plasma using a cleaning species, wherein the cleaning species comprises a mixture of fluorine molecules and one or more inert species.