Polymer compositions having photoacid generators and photoresists

In a first aspect, a polymer composition includes 0.5 to 99 mol% of a hydroxystyrene repeat unit, 0.5 to 99 mol% of a sulfonated photoacid generator repeat unit and 0.5 to 99 mol% of an acid labile repeat unit. In a second aspect, a photoresist composition includes the polymer composition of the fir...

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Bibliographic Details
Main Authors DAI, QIU, THEIVANAYAGAM, MURALI GANTH, SHEEHAN, MICHAEL THOMAS, ZHANG, YONGQIANG
Format Patent
LanguageChinese
English
Published 16.05.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:In a first aspect, a polymer composition includes 0.5 to 99 mol% of a hydroxystyrene repeat unit, 0.5 to 99 mol% of a sulfonated photoacid generator repeat unit and 0.5 to 99 mol% of an acid labile repeat unit. In a second aspect, a photoresist composition includes the polymer composition of the first aspect.
Bibliography:Application Number: TW202312139782