Methods for calibrating simulation process and related non-transitory computer-readable medium

• Main Authors: TIMOSHKOV, VADIM YOURIEVICH, COLINA, LUIS ALBERTO COLINA SANTAMARIA, SLACHTER, ABRAHAM, DILLEN, HERMANUS ADRIANUS, KOOIMAN, MARLEEN, JIANG, AIQIN, RAGHUNATHAN, SUDHARSHANAN, VAN LARE, MARIE-CLAIRE, HUNSCHE, STEFAN, VAN INGEN SCHENAU, KOENRAAD, WANG, FU-MING
• Format: Patent
• Language: Chinese; English
• Published: 01.04.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Described herein are methods related to improving a simulation processes and solutions (e.g., retargeted patterns) associated with manufacturing of a chip. A method includes obtaining a plurality of dose-focus settings, and a reference distribution based on measured values of the characteristic of a printed pattern associated with each setting of the plurality of dose-focus settings. The method further includes, based on an adjustment model and the plurality of dose-focus settings, determining the probability density function (PDF) of the characteristic such that an error between the PDF and the reference distribution is reduced. The PDF can be a function of the adjustment model and variance associated with dose, the adjustment model being configured to change a proportion of non-linear dose sensitivity contribution to the PDF. A process window can be adjusted based on the determined PDF of the characteristic.