Gas analysis device, fluid control system, gas analysis program, and gas analysis method

• Main Authors: MINAMI, MASAKAZU, TAKAHASHI, MOTONOBU, SAKAGUCHI, YUHEI
• Format: Patent
• Language: Chinese; English
• Published: 01.04.2024
• Subjects: CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES; CHEMISTRY; COMPOUNDS THEREOF; CONTROLLING; DISINFECTION, STERILISATION, OR DEODORISATION OF AIR; HUMAN NECESSITIES; HYGIENE; INORGANIC CHEMISTRY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES; MEASURING; MEDICAL OR VETERINARY SCIENCE; METALLURGY; METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL; NON-METALLIC ELEMENTS; PHYSICS; REGULATING; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES; TESTING

The present invention brings an actual concentration of a process gas closer to an ideal concentration, and a gas analysis device that is used in a fluid control system that controls a process gas obtained by vaporizing a liquid material or a solid material, the gas analysis device including: a first concentration calculation unit that calculates a concentration of the process gas; a second concentration calculation unit that calculates a concentration of a by-product gas at least generated in a side reaction that is a reaction different from a main reaction for generating the process gas; a comparison unit that compares a first actual concentration that is the concentration of the process gas calculated by the first concentration calculation unit with a first ideal concentration, and compares a second actual concentration that is the concentration of the by-product gas calculated by the second concentration calculation unit with a second ideal concentration.