Photosensitive resin composition, photosensitive resin layer using the same, color filter and CMOS image sensor
This disclosure relates to a photosensitive resin composition, a photosensitive resin layer manufactured using the same, a color filter, a CMOS image sensor. Some embodiments provide a photosensitive resin composition including (A) an additive; (B) a binder resin; (C) a photopolymerizable compound;...
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Main Authors | , , , , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
01.04.2024
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Subjects | |
Online Access | Get full text |
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Summary: | This disclosure relates to a photosensitive resin composition, a photosensitive resin layer manufactured using the same, a color filter, a CMOS image sensor. Some embodiments provide a photosensitive resin composition including (A) an additive; (B) a binder resin; (C) a photopolymerizable compound; (D) a photopolymerization initiator; (E) a colorant; and (F) a solvent, wherein the additive includes a leveling agent, and the leveling agent is included in an amount of about 15 ppm to about 30 ppm based on a total amount of the photosensitive resin composition. |
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Bibliography: | Application Number: TW202312134977 |