Photosensitive resin composition, photosensitive resin layer using the same, color filter and CMOS image sensor

This disclosure relates to a photosensitive resin composition, a photosensitive resin layer manufactured using the same, a color filter, a CMOS image sensor. Some embodiments provide a photosensitive resin composition including (A) an additive; (B) a binder resin; (C) a photopolymerizable compound;...

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Main Authors LEE, YOUNG-TAI, YOO, JEONG-HO, LEE, SANG-HO, KIM, KWANG-SEOP, KIM, ICK-JIN, KIM, IE-JU, KIM, SABINA, PARK, BAEK-SOUNG, CHO, MYUNG-HO, KIM, JI-HYE, KIM, JI-HONG
Format Patent
LanguageChinese
English
Published 01.04.2024
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Summary:This disclosure relates to a photosensitive resin composition, a photosensitive resin layer manufactured using the same, a color filter, a CMOS image sensor. Some embodiments provide a photosensitive resin composition including (A) an additive; (B) a binder resin; (C) a photopolymerizable compound; (D) a photopolymerization initiator; (E) a colorant; and (F) a solvent, wherein the additive includes a leveling agent, and the leveling agent is included in an amount of about 15 ppm to about 30 ppm based on a total amount of the photosensitive resin composition.
Bibliography:Application Number: TW202312134977