Detection device, lithography apparatus, and article manufacturing method

Detection device detects relative position between overlapping first and second marks. The device includes illumination system configured to illuminate the first and second marks with unpolarized illumination light, detection system having image sensor and configured to form image on imaging surface...

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Bibliographic Details
Main Authors FUJITA, YUICHI, IWAI, TOSHIKI, TODA, SHUN, UNNO, YASUYUKI
Format Patent
LanguageChinese
English
Published 16.03.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Detection device detects relative position between overlapping first and second marks. The device includes illumination system configured to illuminate the first and second marks with unpolarized illumination light, detection system having image sensor and configured to form image on imaging surface of the image sensor from diffracted lights from the first and second marks. The first and second marks are configured to form, on the imaging surface, optical information representing the relative position in first or second direction. Light blocking body arranged on pupil surface of the detection system includes first light blocking portion crossing the optical axis of the detection system in direction conjugate to the first direction and second light blocking portion crossing the optical axis of the detection system in fourth direction conjugate to the second direction.
Bibliography:Application Number: TW202312125384