Wafer washing system and operation method thereof

The present invention discloses a wafer washing system and an operation method thereof. The wafer washing system includes: a washing chamber; a wafer stage device arranged in the washing chamber; a liquid-film generation spray device; a functional-water feeding device, an output end of which is conn...

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Bibliographic Details
Main Authors LU, LEI, DENG, XIN-FU, CHEN, XIN-LAI, XU, MING, JIANG, YUAN
Format Patent
LanguageChinese
English
Published 16.01.2024
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:The present invention discloses a wafer washing system and an operation method thereof. The wafer washing system includes: a washing chamber; a wafer stage device arranged in the washing chamber; a liquid-film generation spray device; a functional-water feeding device, an output end of which is connected with an input end of the liquid-film generation spray device, and a washing spray device. The functional-water feeding device is used to feed a liquid mixed with functional gas. The washing spray device is used to spray a cleaning solution. In the present application, by the liquid-film generation spray device, the wafer is sprayed with the liquid mixed with functional gas in the functional-water feeding device before the main washing operation, so that the wafer surface is formed with a wet interface that is easy to be covered by the chemical cleaning solution while a part of pollutants are removed, thus improving the cleaning effect of the chemical cleaning solution at the spraying site of the subsequent cl
Bibliography:Application Number: TW202312109834